EntreMetrix Corporation (OTCBB: ERMX)
EntreMetrix, Inc. has great raw material in developing Business Development Corporation status to aid its eligible portfolio companies with early stage capital, strategic guidance and operation support. Advanced Nitride Devices, Inc., which is a raw manufacturer of Gallium Nitride (GaN) is delivering semiconductor material that is already in demand.
A lower-temperature technique for growing crystalline gallium nitride (GaN) has been developed at Los Alamos National Laboratory in the US.
The process, which is known as energetic neutral atom-beam lithography, or ENABLE, deposits GaN on a sapphire substrate at temperatures of 100-500[degree]C. this compares to 900-1,100[degree]C for conventional methods, which also require harsh reactive environments.
Gallium nitride is considered to be a candidate for very fast next generation devices, able to support frequencies much higher than GaAs. High process temperatures have been a problem until recently.
“Our lower temperature technique has the potential to allow gallium nitride films to be grown on many more types of inexpensive substrate materials, including glass and certain polymers,” said principal investigator Mark Hoffbauer.
Potential applications include blue LEDs and laser diodes, high-density optical data storage devices and flat panel displays.
The field is wide open for EntreMetrix, Inc. to aid Advanced Nitride Devices, Inc. in their manufacture of Gallium Nitride.
Source:
Yeates, Harry harry.yeates@rbi.co.uk
Electronics Weekly; 3/1/2006 Issue 2230, p7-7, 1/5p
Source:
Entremetrix, Inc.
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